Facilities

Shared experimental facilities include Central Facilities operated by the Nebraska Center for Materials and Nanoscience (NCMN) and Shared Laboratory Facilities specific to this MRSEC. The Central Facilities are recharge centers with faculty supervisors and materials specialists who maintain equipment and train users.

The MRSEC-related Shared Laboratory Facilities are described briefly below.

Materials Research Facilities Network

 

Learn more about our recently installed Pulsed Laser Deposition System.

 

 

 

A. Magnetic Characterization Facilities

David Sellmyer, Sy-Hwang Liou
These facilities allow measurements of a broad variety of magnetic and magnetooptical properties of materials and include
1) two Quantum Design SQUID magnetometers (7 T and 5.5 T),
2) Alternating Force Gradient Magnetometer,
3) Lakeshore vibrating sample magnetometer (300 K – 1000 K),
4) UHV Kerr effect spectrometer.

 

Magnetic Characterization Facilities

 

 

B. Electron Spectroscopy Facilities

Peter Dowben
These facilities permit measurements of the spin-dependent electronic band structure of surfaces and include
1) spin-polarized inverse photoemission and angle-resolved inverse photoemission facilities at UNL,
2) angle-resolved photoemission facilities at Louisiana Center for Advanced Microstructures and Devices,
3) UV and Soft X-ray CVD facilities (ESCA and angle-resolved XPS)
4) high resolution angle-resolved photoemission and spin-polarized electron energy loss facilities

 

Electron Spectroscopy Facilities

 

 

C. Computational Facilities

Kirill Belashchenko, Xiao Cheng Zeng
Two Beowulf-type clusters (one 160-core and one 96-core) based on AMD Opteron processors are maintained for calculations of electronic and atomic structure, spin transport, magnetization dynamics, and other tasks. The clusters utilize Gigabit Ethernet communication that allows us to perform parallel computations. The available software includes state-of-the-art first-principles density functional codes, molecular dynamics, Monte-Carlo, and micromagnetic codes, and visualization software.

 

Computational Facilities

D. Thin Film Growth and Characterization Facilities

Axel Enders, Peter Dowben, Alexei Gruverman
This multi-chamber ultrahigh vacuum system allows users the fabrication and in-situ characterization of structural, electronic, magnetic, and transport properties of atomically-defined materials with sub-nanometer precision. Samples that can be prepared and investigated under ultrahigh vacuum include thin metal films and nanostructures, organics, and soon also complex oxide films. Characterization methods include electron diffraction, electron spectroscopy and scanning probe microscopy.

 

thin film growth facility