For thin film deposition the facility contains 2 systems:
- Sputtering system ATC-2000F (AJA International)
The system contains 4 magnetron sputtering guns 2 DC and 2 RF which allow in-situ tilting of their heads without breaking vacuum. This permits the end user to optimize either uniformity or rate at any working distance in a very short amount of time without venting, resetting the angle, pump down and test. The system can handle substrates up to 4 inches in diameter and the substrate holder will allow simultaneous rotation, heating, RF bias and deposition at up to 850 °C in suitable sputtering environment (600 °C in a pure Oxygen environment). A load lock chamber and cassette allows the samples to be removed and changed without venting the chamber. The cassette can hold up to 6 substrates holders.
- Pulsed Laser Deposition system PLD-MBE 2500 (PVD Products)
The PLD system has a target manipulator that handles six 2-inch diameter targets. Targets are held in pedestals by gravity so target clamping is not required. The system will allow simultaneous rotation of target and substrate. The system allows for in situ heating up to 950 °C and RHEED measurements.
The facility has two tube furnaces. The Lindberg 55322 oven is a Split-Hinge Single Zone Furnace with a Tmax = 1200 °C and a working tube of diameter 2.5 inches. And the Lindberg 54233 tube oven has an operating temperature of Tmax = 1500 °C and a working tube of diameter 2 inches.
Both ovens have programmable power supplies/temperature controllers and associated pump stations that can reach a base pressure 2 x 10-6 Torr. Applications include ashing, sintering, crystallizing, annealing, etc. The tube furnaces are used for crystal growth because of their small volume and precision with which the temperature can be controlled. The ends of the tubes do not get very hot and various adapters may be placed on the ends. This permits reactions under controlled atmosphere using reactive/un-reactive gases or a vacuum.